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  418-500ML, Positive Photo Resist Developer

 
Our Price: $9.95


Stock Status:In Stock
Product Code: 418-500ML
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Description
 
For removing exposed resist during the positive photofabrication process.


Disolves exposed photoresist
Concentrated formulation - dilute one part developer to ten parts water
For best results, use in conjunction with M.G. Foam Brush (Cat. No. 416-S)
Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .

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